etch rate uniformity
基本解释
- [電子、通信與自動控制技術]刻蝕速率均勻性
英汉例句
- It is proved that the uniformity of etch rate can be improved and the effect of micro load can be decreased by adjusting the value of chamber pressure, gas flow rate and RF power properly.
結果表明，通過對反應室壓力、刻蝕氣躰流量和射頻功率的調節，可以降低微負載傚應的影響，得到良好的刻蝕均勻性。
雙語例句
专业释义
- 刻蝕速率均勻性