low pressure chemical vapor deposition

基本解释

The traditional ways to obtain polycrystalline film include solid phase crystallization (SPC), low pressure chemical vapor deposition (LPCVD) and excimer laser annealing (ELA).
目前常用的几种获得多晶薄膜的方法包括：低压化学气相沉积、固相结晶、准分子激光晶化等。
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Ultra-high Vacuum Chemical Vapor Deposition (UHVCVD) was a good choice, it provided a super clean, low temperature, low pressure ambient, and controlled thin films' growth precisely.
超高真空化学气相沉积（UHVCVD）具有超净的生长环境、能够在低温、低压下生长锗硅材料，可精确控制薄膜生长等优点。
Diamond thin films were successfully deposited on single - crystal Si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD) .
采用国内研制的电子回旋共振化学气相沉积（ECRCVD）设备，在单晶硅衬底上沉积了金刚石薄膜。